551건 · 관련도순
Convert LLMs to GGUF and reduce model size through quantization, which stores weights at lower numerical precision. Prepare models for CPU or Apple Silicon inference, compare compression levels, and integrate them with local AI tools.
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Use when working with icons in any project. Provides CLI for searching 200+ icon libraries (Iconify) and retrieving SVGs. Commands: `better-icons search <query>` to find icons, `better-icons get <id>` to get SVG. Also available as MCP server for AI agents.
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Fix invisible or poorly visible SVG icons in Flutter when using flutter_svg package. Use when: (1) SVG icons appear invisible despite correct colors in the SVG file, (2) Using Opacity widget to change icon visibility/state but icons don't render properly, (3) Tab bar or navigation icons disappear or have wrong colors, (4) Icons with fill="white" don't show on dark backgrounds. The fix is to use ColorFilter.mode() instead of Opacity widget for SVG icon state styling.
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Generate NowStack Mobile app icons and logos. Use for `/ns icon`, app icon, iOS logo, launcher icon, favicon, or logo refresh. By default ALWAYS generate exactly 8 different iOS-quality icon candidates first, then finalize one icon and derive app/web assets.
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Expert-level semiconductor materials covering band theory, silicon processing, compound semiconductors, wide bandgap materials, and semiconductor device fundamentals.
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Intended to generate icons in multiple sizes with a consistent visual style for apps, websites, and user interfaces. The supplied description outlines this purpose, but the skill file is a placeholder without operational instructions.
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Use when working with icons in any project. Provides CLI for searching 200+ icon libraries (Iconify) and retrieving SVGs. Commands: `better-icons search <query>` to find icons, `better-icons get <id>` to get SVG. Also available as MCP server for AI agents.
한국어 요약은 준비 중입니다. 원문 설명을 표시하고 있습니다.
Use when working with icons in any project. Provides CLI for searching 200+ icon libraries (Iconify) and retrieving SVGs. Commands: `better-icons search <query>` to find icons, `better-icons get <id>` to get SVG. Also available as MCP server for AI agents.
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半导体芯片制造工艺 (Semiconductor Process Engineering / 半导体芯片制造工艺 — 以「物理化学极限 + 良率经济双重约束」为特征的集成电路前道/后道制造工艺认知操作系统：从「器件架构与微缩路线（planar→FinFET→GAA nanosheet→CFET、等效微缩 DTCO/STCO、背面供电 BSPDN）→ 工艺整合（FEOL/MOL/BEOL 模块协同、PDK、流片 tape-out）→ 单元工艺（光刻 litho（DUV 浸没式 193i / EUV 13.5nm / 多重曝光 SADP-SAQP / OPC / mask）、刻蚀 etch（RIE/ICP/原子层刻蚀 ALE）、薄膜沉积 depo（CVD/PECVD/LPCVD/ALD/PVD/外延 epi/电镀 Cu）、掺杂 doping（离子注入 ion implant / 退火 RTA-laser anneal）、CMP 化学机械抛光、清洗 cleaning）→ 量测检测 metrology（CD-SEM / OCD / overlay / 椭偏 ellipsometry / 缺陷检测 defect inspection / e-beam）→ 良率工程 yield（缺陷密度 / SPC 统计过程控制 / FDC / APC / DOE 实验设计 / 良率爬坡 yield ramp）→ 先进封装 advanced packaging（2.5D/3D、CoWoS、HBM、混合键合 hybrid bonding、chiplet、TSV）」的完整器件-工艺-良率-量产决策链。覆盖 (a) 第一性张力 — **物理/化学/材料的硬约束（量子隧穿、短沟道效应、RC 延迟、热预算、缺陷物理、ppb 级污染控制）⇄ 良率/成本/产能的经济约束（每片晶圆成本、良率是主经济指标、D0 缺陷密度、wafer-per-hour、折旧）**；**持续微缩/摩尔定律（dimensional + equivalent scaling、节点路线图 N5/N3/N2/A16/A14、high-NA EUV）⇄ 物理极限/微缩放缓（原子尺度、漏电、功耗墙、成本墙、'摩尔定律已死'之争）**；**协同优化/整合（DTCO 设计-工艺协同、STCO 系统-工艺协同、模块间 trade-off）⇄ 单模块极致优化（单一 unit process 工艺窗口）**；**工艺配方的 tacit 手艺（process recipe 调试、工艺窗口、缺陷根因分析、量产 ramp 的经验）⇄ 可建模/可仿真/数据驱动（TCAD 仿真、ML 良率分析、APC/FDC、数字孪生）**；**性能-功耗-面积-成本 PPAC 四角权衡 ⇄ 良率/可制造性 DFM 优先**；**自主可控/国产替代（卡脖子、EUV 出口管制、设备/材料/EDA 国产化、SMIC/长江存储/长鑫/中微/北方华创/上海微电子）⇄ 全球高度分工（ASML 光刻垄断、AMAT/Lam/TEL/KLA 设备、TSMC/Samsung/Intel 代工、全球供应链）**。(b) 核心工作流 / pipeline（最标准、最易蒸高质量 + CLI 化）— 新节点/新工艺导入：器件目标与 PPAC 定义 → 工艺整合方案与 PDK → 单元工艺开发与配方调试（DOE 找工艺窗口）→ 量测建立与 SPC → 良率爬坡（缺陷分类 + 根因分析 + 工艺改善）→ 量产移交与持续改善。具体单元工艺 SOP：光刻（曝光条件 / OPC / overlay 控制 / 多重曝光分解）、刻蚀（选择比 / profile / loading effect / ALE）、沉积（台阶覆盖 / 应力 / 均匀性）、CMP（去除速率 / 碟形 dishing / 侵蚀 erosion）、量测与缺陷分析、良率分析与 FA 失效分析。(c) 工具栈 — 设备（光刻 ASML/上海微电子 SMEE；刻蚀+沉积 AMAT/Lam/TEL/中微 AMEC/北方华创 Naura；离子注入 AMAT/Axcelis；CMP AMAT/荏原 Ebara；量测检测 KLA/AMAT/中科飞测/上海精测）、EDA/TCAD/仿真（Synopsys Sentaurus/Silvaco/Coventor SEMulator3D、OPC Calibre/Synopsys）、良率与制造软件（SPC、MES、FDC/APC、缺陷分析 yield management、PWS）、材料（光刻胶 photoresist、CMP 浆料 slurry、特气、靶材、掩膜 mask blank）。(d) 知识正典 — 半导体工艺 canon 横跨器件物理与制造工程：核心教材（Plummer/Deal/Griffin《Silicon VLSI Technology》、Sze《Physics of Semiconductor Devices》《VLSI Technology》、Wolf & Tauber《Silicon Processing for the VLSI Era》、Campbell《Fabrication Engineering at the Micro and Nanoscale》、May & Spanos《Fundamentals of Semiconductor Manufacturing and Process Control》、Quirk & Serda《Semiconductor Manufacturing Technology》、肖国勇/施敏中文教材）、路线图（ITRS/IRDS、IEEE 国际器件与系统路线图）、顶会论文（IEDM、Symposium on VLSI Technology、IRPS 可靠性、SPIE Advanced Lithography、ISSCC、DAC）、行业分析（SemiAnalysis、TechInsights、IC Knowledge）。(e) figures/流派 — 学术与器件奠基（Gordon Moore 摩尔、Robert Dennard 登纳德微缩、胡正明 Chenming Hu FinFET/UTB-SOI 发明人 UC Berkeley、刘明 Tsu-Jae King Liu Berkeley、Krishna Saraswat Stanford、Mark Bohr Intel 工艺架构）、产业领袖与工艺大师（张忠谋 Morris Chang TSMC、林本坚 Burn-Jeng Lin 浸没式光刻、Martin van den Brink ASML、米玉杰/梁孟松 SMIC/三星工艺、Mark Liu/魏哲家 TSMC）、行业分析师（Dylan Patel SemiAnalysis、Scotten Jones IC Knowledge、TechInsights 拆解、Handel Jones）、科普与拆解（Asianometry、The Chip Letter、半导体行业观察）。流派分歧：等效微缩派 vs 摩尔定律已死派、前道微缩 vs 先进封装 chiplet 异构集成、dimensional scaling vs DTCO 协同优化、IDM vs 纯代工 foundry 模式、自主可控/国产替代路线 vs 全球分工。(f) 行业话术/黑话 — 制程节点 node / 流片 tape-out / 工艺窗口 process window / 良率 yield / 缺陷密度 D0 / 关键尺寸 CD / 套刻 overlay / 掩膜 reticle-mask / 光刻胶 PR / 浸没式 immersion / EUV/DUV / 多重曝光 multi-patterning SADP-SAQP / OPC / 刻蚀选择比 selectivity / profile / loading effect / 原子层刻蚀 ALE / 台阶覆盖 step coverage / 外延 epi / 离子注入 implant / 退火 anneal / RTA / CMP / dishing-erosion / FEOL-MOL-BEOL / FinFET / GAA / 纳米片 nanosheet / CFET / 背面供电 BSPDN / high-NA / PPAC / DTCO-STCO / DFM / SPC / FDC-APC / DOE / WAT-PCM / 良率爬坡 yield ramp / FA 失效分析 / particle 颗粒 / 洁净室 cleanroom-级别 / 12寸-8寸 wafer / chiplet / CoWoS / HBM / 混合键合 hybrid bonding / TSV / PDK / 等效微缩. (g) 争议/批判 — 「摩尔定律是否已死 vs 等效微缩继续」、「节点命名营销化（N3/N2 ≠ 物理 3nm/2nm，gate pitch/metal pitch 才是真尺度）」、「前道微缩 vs 先进封装异构集成谁是未来」、「自主可控/国产替代的现实（EUV 卡脖子、设备/材料/EDA 国产化进度、出口管制 entity list、良率与成熟度差距）」、「良率/成本/性能三角权衡」、「人才稀缺与工艺 know-how 的 tacit 性」、「中国大基金/产能扩张是否过剩」、「制裁与技术封锁」。(h) 大量隐性工艺手艺（process recipe 调试与工艺窗口寻找、缺陷根因分析与 FA、量产良率爬坡的经验判
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Design an icon system spec or audit existing icons for consistency and accessibility. Use when asked to "design an icon system", "audit our icons", or "are our icons consistent".
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Generate multiple app, favicon, or website icon candidates with either the local QM Icon Studio CLI or Codex built-in image generation with reference icons, then present a contact sheet so the user can choose. Use when building websites or apps and needing reusable icon options.
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Compress screen recordings on Apple Silicon Macs using dedicated video hardware. Choose quality settings for sharing or archiving, inspect video properties, and check the resulting file size and storage savings.
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Compress screen recordings on Apple Silicon Macs using dedicated HEVC video encoding hardware. Choose quality presets for sharing or archiving, inspect source files, and review file size savings through command output.
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Create and review SVG icons for IntelliJ New UI. Choose sizes by interface role, prepare matching light and dark versions, refine shapes and strokes, and place the assets in the plugin’s resource folders.
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Create or refine custom icon assets as native or traced SVGs and transparent PNG/WebP files. Use when the user asks for a bespoke icon or cohesive icon set, wants an image traced into a clean vector, or needs a detailed or 3D icon with transparency.
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Resolve an icon request to an Iconify name and emit the stack's embedding. Use when adding icons, picking an icon set, or wiring Lucide/Heroicons/Phosphor/Tabler.
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Finding and accessing AI/LLM model brand icons from lobe-icons library. Use when users need icon URLs, want to download brand logos for AI models/providers/applications (Claude, GPT, Gemini, etc.), or request icons in SVG/PNG/WEBP formats.
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Find background music, sound effects, images, and icons from existing assets, shared caches, or HeyGen. Save selected files locally and register them in an inventory, giving the agent a usable file path.
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Create blog illustrations, technical diagrams, comparisons, comics, and icons through workflows tailored to each format. The skill guides composition, color, and model selection, then stages generated images for review before they are used in a project.
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Refine interface surfaces, icons, and motion with specific values for corners, shadows, alignment, and transitions. Preserve the project's existing design conventions while identifying visual inconsistencies, touch interaction problems, and missing alternatives for reduced motion.
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Design engineering principles for making interfaces feel polished. Use when building UI components, reviewing frontend code, implementing animations, hover states, shadows, borders, typography, icons, micro-interactions, enter/exit animations, or any visual detail work. Supports quick and full review modes. Triggers on UI polish, design details, "make it feel better", "feels off", stagger animations, border radius, optical alignment, font smoothing, tabular numbers, image outlines, box shadows, icons, icon stroke weight, icon states, motion restraint.
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Amplicon sequence variant (ASV) inference from 16S rRNA or ITS amplicon sequencing using DADA2. Covers quality filtering, error learning, denoising, and chimera removal. Use when processing demultiplexed amplicon FASTQ files to generate an ASV table for downstream analysis.
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Fetch brand SVG logos and cloud architecture icons (AWS, Azure, GCP) from theSVG. Use when the user asks for a brand logo, company icon, framework mark, service icon, or any "icon/logo for X" where X is a real brand or cloud service. Returns ready-to-use CDN URLs or raw SVG markup.
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Resolve the architecture of focal oncogene amplifications — extrachromosomal DNA (ecDNA), breakage-fusion-bridge (BFB) cycles, homogeneously staining regions (HSR), and linear amplification — from whole-genome sequencing with AmpliconArchitect, the AmpliconSuite pipeline, and AmpliconClassifier. Covers copy-number seed selection, breakpoint-graph reconstruction, balanced-flow optimization, ecDNA classification, and the limits of depth-only amplification calls. Use when a focal amplification needs structural characterization, when distinguishing ecDNA from chromosomal amplification, suspecting ecDNA-driven oncogene amplification or therapy resistance, or selecting copy-number seeds for amplicon reconstruction.
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